23 March 2024 | Xiaoli Tian, Fu Li, Zhenyuan Tang, Song Wang, Kangkang Weng, Dan Liu, Shaoyong Lu, Wangyu Liu, Zhong Fu, Wenjun Li, Hengwei Qiu, Min Tu, Hao Zhang, Jinghong Li
The paper introduces a novel method called Crosslinking-Induced Patterning (CLIP-MOF) for the direct patterning of Metal-Organic Frameworks (MOFs) using photo- and electron-beam lithography. This method overcomes the limitations of existing MOF patterning techniques, which often suffer from poor material adaptability, low resolution, and degraded properties. CLIP-MOF uses a resist-free approach where crosslinkers are added to colloidal MOF nanoparticles (NPs) to form crosslinked networks in exposed areas, making them insoluble in developer solvents. This allows for selective removal of unexposed MOF films, enabling high-resolution (micro- and nanoscale) patterning on large-area substrates. The method is universal to various MOFs with diverse chemistries, structures, and functionalities, preserving their crystallinity, porosity, and other properties. The authors demonstrate the effectiveness of CLIP-MOF through experiments with different MOFs, including ZIF-8, ZIF-7, HKUST-1, UiO-66, and Eu(BTC), and show its potential in applications such as diffractive gas sensors and electrochromic pixels. The technique's scalability, precision, and versatility make it a promising approach for integrating MOFs into solid-state devices, with implications in microelectronics, nanophotonics, sensing, and biomedical applications.The paper introduces a novel method called Crosslinking-Induced Patterning (CLIP-MOF) for the direct patterning of Metal-Organic Frameworks (MOFs) using photo- and electron-beam lithography. This method overcomes the limitations of existing MOF patterning techniques, which often suffer from poor material adaptability, low resolution, and degraded properties. CLIP-MOF uses a resist-free approach where crosslinkers are added to colloidal MOF nanoparticles (NPs) to form crosslinked networks in exposed areas, making them insoluble in developer solvents. This allows for selective removal of unexposed MOF films, enabling high-resolution (micro- and nanoscale) patterning on large-area substrates. The method is universal to various MOFs with diverse chemistries, structures, and functionalities, preserving their crystallinity, porosity, and other properties. The authors demonstrate the effectiveness of CLIP-MOF through experiments with different MOFs, including ZIF-8, ZIF-7, HKUST-1, UiO-66, and Eu(BTC), and show its potential in applications such as diffractive gas sensors and electrochromic pixels. The technique's scalability, precision, and versatility make it a promising approach for integrating MOFs into solid-state devices, with implications in microelectronics, nanophotonics, sensing, and biomedical applications.