Direct electron beam patterning of electro-optically active PEDOT:PSS

Direct electron beam patterning of electro-optically active PEDOT:PSS

January 4, 2024 | Siddharth Doshi*, Dominik Ludescher*, Julian Karst, Moritz Floess, Johan Carlström, Bohan Li, Nofar Mintz Hemed, Yi-Shiou Duh, Nicholas A. Melosh, Mario Hentschel, Mark Brongersma and Harald Giessen
The research article by Siddharth Doshi et al. presents a novel method for high-resolution, direct electron beam (EBL) patterning of the conductive polymer poly(3,4-ethylenedioxythiophene):poly (styrene sulfonate) (PEDOT:PSS). This method allows for the creation of nano-wire structures with feature sizes down to 250 nm, significantly finer than previously reported direct write methods. The EBL process involves exposing a PEDOT:PSS film to an electron beam, which reduces its solubility in water, followed by a simple development step. The resulting structures maintain the conductivity, electrochemical, and optical properties of PEDOT:PSS, making them suitable for various applications in bioelectronics, flexible electronics, and micro- and nano-photonics. The authors demonstrate the potential of their method by fabricating electrically switchable optical diffraction gratings. These gratings can be switched between a metallic and dielectric state with over 95% contrast using CMOS-compatible voltages, highlighting their suitability for low-power, dynamic optoelectronic systems. The study also shows that the EBL-exposed PEDOT:PSS retains its transparency and metallic optical properties at near-infrared and infrared wavelengths, enabling dynamic control of optical wavefronts. The research concludes that the direct EBL patterning method simplifies the fabrication process for conductive polymer-based devices and opens up new possibilities for miniaturized, active micro- and nano-optics.The research article by Siddharth Doshi et al. presents a novel method for high-resolution, direct electron beam (EBL) patterning of the conductive polymer poly(3,4-ethylenedioxythiophene):poly (styrene sulfonate) (PEDOT:PSS). This method allows for the creation of nano-wire structures with feature sizes down to 250 nm, significantly finer than previously reported direct write methods. The EBL process involves exposing a PEDOT:PSS film to an electron beam, which reduces its solubility in water, followed by a simple development step. The resulting structures maintain the conductivity, electrochemical, and optical properties of PEDOT:PSS, making them suitable for various applications in bioelectronics, flexible electronics, and micro- and nano-photonics. The authors demonstrate the potential of their method by fabricating electrically switchable optical diffraction gratings. These gratings can be switched between a metallic and dielectric state with over 95% contrast using CMOS-compatible voltages, highlighting their suitability for low-power, dynamic optoelectronic systems. The study also shows that the EBL-exposed PEDOT:PSS retains its transparency and metallic optical properties at near-infrared and infrared wavelengths, enabling dynamic control of optical wavefronts. The research concludes that the direct EBL patterning method simplifies the fabrication process for conductive polymer-based devices and opens up new possibilities for miniaturized, active micro- and nano-optics.
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Understanding Direct electron beam patterning of electro-optically active PEDOT%3APSS