This review discusses the advancements in electron beam (e-beam) lithography on nonplanar and irregular surfaces, highlighting the challenges and innovative solutions. Traditional spin coating methods are inadequate for irregular substrates, necessitating alternative approaches such as evaporation, spray coating, ice lithography, and self-assembled monolayers (SAMs). Evaporated resists, including nonpolymeric sterol, metal halides, and polystyrene, offer high resolution and ease of use but have limitations in sensitivity and application. Ice lithography, particularly using water and organic ice, provides high-resolution patterns on irregular surfaces without the need for development, but it requires specialized instruments and maintains low temperatures. Monolayer polymer brushes, such as PMMA and PS, are cost-effective and chemically bond to the substrate, preventing pattern collapse during development. Self-assembled monolayers (SAMs) form chemically bonded monolayers and can be used as positive or negative resists, depending on the substrate material. Thermally grown silicon dioxide (SiO2) resists, when exposed to an e-beam, exhibit a high etching rate in hydrofluoric acid, making them suitable for patterning irregular surfaces. These advancements significantly extend the capabilities of e-beam lithography in nanofabrication, particularly for applications in atomic force microscopy tips, optical fibers, and porous membranes.This review discusses the advancements in electron beam (e-beam) lithography on nonplanar and irregular surfaces, highlighting the challenges and innovative solutions. Traditional spin coating methods are inadequate for irregular substrates, necessitating alternative approaches such as evaporation, spray coating, ice lithography, and self-assembled monolayers (SAMs). Evaporated resists, including nonpolymeric sterol, metal halides, and polystyrene, offer high resolution and ease of use but have limitations in sensitivity and application. Ice lithography, particularly using water and organic ice, provides high-resolution patterns on irregular surfaces without the need for development, but it requires specialized instruments and maintains low temperatures. Monolayer polymer brushes, such as PMMA and PS, are cost-effective and chemically bond to the substrate, preventing pattern collapse during development. Self-assembled monolayers (SAMs) form chemically bonded monolayers and can be used as positive or negative resists, depending on the substrate material. Thermally grown silicon dioxide (SiO2) resists, when exposed to an e-beam, exhibit a high etching rate in hydrofluoric acid, making them suitable for patterning irregular surfaces. These advancements significantly extend the capabilities of e-beam lithography in nanofabrication, particularly for applications in atomic force microscopy tips, optical fibers, and porous membranes.