Electron beam lithography (EBL) is a powerful technique for creating nanostructures and nanodevices with sub-nanometer resolution. However, traditional methods like spin coating are not suitable for irregular surfaces, necessitating alternative approaches. This review discusses recent advancements in EBL on nonplanar and irregular surfaces, including uniform film coating, instrumentation improvements, and new pattern transfer methods. Key techniques include evaporated resists, ice lithography, and self-assembled monolayers (SAMs). Evaporated resists, such as nonpolymeric sterols, metal halides, and polystyrene, offer high resolution and development-free processes. Ice lithography, using water or organic ice as resists, enables high-resolution patterning on irregular surfaces. SAMs, formed via chemical bonding, provide chemically stable monolayers for EBL. Additionally, thermally grown silicon dioxide can serve as a resist for EBL on silicon substrates. These methods significantly enhance the capabilities of EBL in nanofabrication, enabling the creation of complex 3D structures and patterns on irregular surfaces. Despite their advantages, challenges remain, including the need for specialized equipment and the limitations of certain materials. Overall, these advancements expand the applications of EBL in nanotechnology and microfabrication.Electron beam lithography (EBL) is a powerful technique for creating nanostructures and nanodevices with sub-nanometer resolution. However, traditional methods like spin coating are not suitable for irregular surfaces, necessitating alternative approaches. This review discusses recent advancements in EBL on nonplanar and irregular surfaces, including uniform film coating, instrumentation improvements, and new pattern transfer methods. Key techniques include evaporated resists, ice lithography, and self-assembled monolayers (SAMs). Evaporated resists, such as nonpolymeric sterols, metal halides, and polystyrene, offer high resolution and development-free processes. Ice lithography, using water or organic ice as resists, enables high-resolution patterning on irregular surfaces. SAMs, formed via chemical bonding, provide chemically stable monolayers for EBL. Additionally, thermally grown silicon dioxide can serve as a resist for EBL on silicon substrates. These methods significantly enhance the capabilities of EBL in nanofabrication, enabling the creation of complex 3D structures and patterns on irregular surfaces. Despite their advantages, challenges remain, including the need for specialized equipment and the limitations of certain materials. Overall, these advancements expand the applications of EBL in nanotechnology and microfabrication.