Epitaxy of wafer-scale single-crystal MoS2 monolayer via buffer layer control

Epitaxy of wafer-scale single-crystal MoS2 monolayer via buffer layer control

28 February 2024 | Lu Li, Qin Qin Wang, Fanfan Wu, Qiaoling Xu, Jinpeng Tian, Zhiheng Huang, Qinghe Wang, Xuan Zhao, Qinghua Zhang, Qinkai Fan, Xiuzhen Li, Yalin Peng, Yangkun Zhang, Kunshan Ji, Aomiao Zhi, Huacong Sun, Mingtong Zhu, Jundong Zhu, Nianpeng Lu, Ying Lu, Shuopei Wang, Xuedong Bai, Yang Xu, Wei Yang, Na Li, Dongxia Shi, Ledie Xian, Kaihui Liu, Luojun Du & Guangyu Zhang
This study presents a method for the epitaxial growth of large-scale, single-crystal monolayer molybdenum disulfide (MoS₂) on c-plane sapphire substrates through precise control of the S/MoO₃ precursor ratio. The research demonstrates the successful growth of 2-inch single-crystal MoS₂ monolayers with high uniformity and quality, characterized by excellent phonon circular dichroism, exciton valley polarization, high room-temperature mobility, and a high on/off ratio. The method enables the seamless alignment and stitching of MoS₂ domains across the entire wafer, achieving a high-quality, single-crystal monolayer with no grain boundaries. The epitaxial MoS₂ monolayers exhibit state-of-the-art performance, including a room-temperature mobility of ~140 cm²/V·s and an on/off ratio of ~10⁹. The study provides a simple and effective strategy for the large-scale synthesis of high-quality 2D semiconductors on commercial substrates, paving the way for the development of 2D electronic circuits and further extending Moore's law. The results demonstrate the potential of MoS₂ as a promising candidate for next-generation electronic devices.This study presents a method for the epitaxial growth of large-scale, single-crystal monolayer molybdenum disulfide (MoS₂) on c-plane sapphire substrates through precise control of the S/MoO₃ precursor ratio. The research demonstrates the successful growth of 2-inch single-crystal MoS₂ monolayers with high uniformity and quality, characterized by excellent phonon circular dichroism, exciton valley polarization, high room-temperature mobility, and a high on/off ratio. The method enables the seamless alignment and stitching of MoS₂ domains across the entire wafer, achieving a high-quality, single-crystal monolayer with no grain boundaries. The epitaxial MoS₂ monolayers exhibit state-of-the-art performance, including a room-temperature mobility of ~140 cm²/V·s and an on/off ratio of ~10⁹. The study provides a simple and effective strategy for the large-scale synthesis of high-quality 2D semiconductors on commercial substrates, paving the way for the development of 2D electronic circuits and further extending Moore's law. The results demonstrate the potential of MoS₂ as a promising candidate for next-generation electronic devices.
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