Fluorographene (FG) is a two-dimensional (2D) material derived from graphene by attaching fluorine atoms to each carbon. It is a high-quality insulator with a resistivity of >10¹² Ω and an optical gap of 3 eV. FG inherits the mechanical strength of graphene, with a Young's modulus of 100 N/m and can sustain strains of 15%. It is chemically inert and stable up to 400°C, similar to Teflon. FG is a wide-gap insulator with mechanical and thermal stability comparable to Teflon, making it suitable for use as an atomically thin tunnel barrier. FG was synthesized by fluorinating graphene using XeF₂, which avoids ion bombardment and is a low-hazard process. The material was characterized using Raman spectroscopy, which showed distinct differences from hydrogenated graphene and graphene oxide. FG exhibits a wide bandgap, with optical transparency up to 3 eV, and is a wide-gap semiconductor with E_g ≥ 3.0 eV. FG is highly insulating, with room-temperature resistivity in the MOhm range, three orders of magnitude higher than graphene. FG is mechanically stiff and stretchable, with a Young's modulus of ~100 N/m and a breaking strength of ~15 N/m. It can sustain elastic deformations of ~15%, similar to graphene. FG is also stable in various liquids and under ambient conditions, with chemical stability similar to Teflon and graphite fluoride. FG was also demonstrated as a 2D Teflon-like material, with a transparent, yellowish color and optical transparency up to 3 eV. FG paper, made from fluorinated graphene laminates, is stable under ambient conditions and at elevated temperatures, with optical properties similar to Teflon. FG is a stoichiometric derivative of graphene, with a wide bandgap and high thermal and chemical stability. It is a promising material for various applications, including as an insulator or tunnel barrier in graphene-based heterostructures. FG's properties make it suitable for applications where stability and inertness are required, surpassing those of graphene oxide and graphite fluoride.Fluorographene (FG) is a two-dimensional (2D) material derived from graphene by attaching fluorine atoms to each carbon. It is a high-quality insulator with a resistivity of >10¹² Ω and an optical gap of 3 eV. FG inherits the mechanical strength of graphene, with a Young's modulus of 100 N/m and can sustain strains of 15%. It is chemically inert and stable up to 400°C, similar to Teflon. FG is a wide-gap insulator with mechanical and thermal stability comparable to Teflon, making it suitable for use as an atomically thin tunnel barrier. FG was synthesized by fluorinating graphene using XeF₂, which avoids ion bombardment and is a low-hazard process. The material was characterized using Raman spectroscopy, which showed distinct differences from hydrogenated graphene and graphene oxide. FG exhibits a wide bandgap, with optical transparency up to 3 eV, and is a wide-gap semiconductor with E_g ≥ 3.0 eV. FG is highly insulating, with room-temperature resistivity in the MOhm range, three orders of magnitude higher than graphene. FG is mechanically stiff and stretchable, with a Young's modulus of ~100 N/m and a breaking strength of ~15 N/m. It can sustain elastic deformations of ~15%, similar to graphene. FG is also stable in various liquids and under ambient conditions, with chemical stability similar to Teflon and graphite fluoride. FG was also demonstrated as a 2D Teflon-like material, with a transparent, yellowish color and optical transparency up to 3 eV. FG paper, made from fluorinated graphene laminates, is stable under ambient conditions and at elevated temperatures, with optical properties similar to Teflon. FG is a stoichiometric derivative of graphene, with a wide bandgap and high thermal and chemical stability. It is a promising material for various applications, including as an insulator or tunnel barrier in graphene-based heterostructures. FG's properties make it suitable for applications where stability and inertness are required, surpassing those of graphene oxide and graphite fluoride.