The paper reports the creation of fluorographene, a two-dimensional (2D) material with each carbon atom bonded to a fluorine atom. This material is a high-quality insulator with a resistivity greater than 10^12 Ω and an optical gap of 3 eV. Fluorographene retains the mechanical strength of graphene, exhibiting a Young's modulus of 100 N/m and sustaining strains of 15%. It is highly stable, remaining inert and stable up to 400°C even in air, similar to Teflon. The study involves Raman, optical, structural, micromechanical, and transport studies, which show that fluorographene is qualitatively different from known graphene-based nonstoichiometric derivatives. The material's properties make it suitable for applications requiring high stability and inertness, such as in electronic devices and coatings.The paper reports the creation of fluorographene, a two-dimensional (2D) material with each carbon atom bonded to a fluorine atom. This material is a high-quality insulator with a resistivity greater than 10^12 Ω and an optical gap of 3 eV. Fluorographene retains the mechanical strength of graphene, exhibiting a Young's modulus of 100 N/m and sustaining strains of 15%. It is highly stable, remaining inert and stable up to 400°C even in air, similar to Teflon. The study involves Raman, optical, structural, micromechanical, and transport studies, which show that fluorographene is qualitatively different from known graphene-based nonstoichiometric derivatives. The material's properties make it suitable for applications requiring high stability and inertness, such as in electronic devices and coatings.