High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures

High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures

April 1, 2024 | Aljoscha Söll, Edoardo Lopriore, Asmund Ottesen, Jan Luxa, Gabriele Pasquale, Jiri Sturala, František Hájek, Vítězslav Járý, David Sedmidubský, Ksenia Mosina, Igor Sokolović, Saeed Rasouli, Tibor Grasser, Ulrike Diebold, Andras Kis, and Zdeněk Sofer
This study presents the synthesis and characterization of LaOBr, a rare-earth oxyhalide with a high dielectric constant (ε₀ ≈ 9) and a wide bandgap of 5.3 eV, suitable for use as a high-κ dielectric in two-dimensional (2D) van der Waals heterostructures. The researchers developed a high-temperature flux growth method to produce large, stoichiometric LaOBr crystals, which were then exfoliated into 2D flakes. These flakes were used as dielectrics in van der Waals field-effect transistors (FETs) and as encapsulants for excitonic devices based on 2D materials. The LaOBr dielectric exhibited low leakage currents, high breakdown voltage (8 MV/cm), and a low interface defect concentration, making it an ideal material for high-performance 2D electronic devices. The study also demonstrated that LaOBr can be used as a gate dielectric to control excitonic features in 2D materials, showing the modulation of excitonic species in MoSe₂ by electronic gating. The results highlight the potential of LaOBr as a versatile high-κ dielectric for 2D heterostructures, offering a promising alternative to traditional high-κ oxides like Al₂O₃. The work underscores the importance of van der Waals heterostructures in advancing 2D materials-based electronics and optoelectronics.This study presents the synthesis and characterization of LaOBr, a rare-earth oxyhalide with a high dielectric constant (ε₀ ≈ 9) and a wide bandgap of 5.3 eV, suitable for use as a high-κ dielectric in two-dimensional (2D) van der Waals heterostructures. The researchers developed a high-temperature flux growth method to produce large, stoichiometric LaOBr crystals, which were then exfoliated into 2D flakes. These flakes were used as dielectrics in van der Waals field-effect transistors (FETs) and as encapsulants for excitonic devices based on 2D materials. The LaOBr dielectric exhibited low leakage currents, high breakdown voltage (8 MV/cm), and a low interface defect concentration, making it an ideal material for high-performance 2D electronic devices. The study also demonstrated that LaOBr can be used as a gate dielectric to control excitonic features in 2D materials, showing the modulation of excitonic species in MoSe₂ by electronic gating. The results highlight the potential of LaOBr as a versatile high-κ dielectric for 2D heterostructures, offering a promising alternative to traditional high-κ oxides like Al₂O₃. The work underscores the importance of van der Waals heterostructures in advancing 2D materials-based electronics and optoelectronics.
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