Hopping transport through defect-induced localized states in molybdenum disulphide

Hopping transport through defect-induced localized states in molybdenum disulphide

23 Oct 2013 | Hao Qiu, Tao Xu, Zilu Wang, Wei Ren, Haiyan Nan, Zhenhua Ni, Qian Chen, Shijun Yuan, Feng Miao, Fengqi Song, Gen Long, Yi Shi, Litao Sun, Jinlan Wang & Xinran Wang
This study investigates the charge transport in few-layer molybdenum disulfide (MoS₂) devices, focusing on the role of defect-induced localized states. Using transmission electron microscopy (TEM), density functional theory (DFT), and tight-binding calculations, the researchers provide evidence of sulfur vacancies (SVs) in MoS₂, which introduce localized donor states within the bandgap. At low carrier densities, transport is dominated by nearest-neighbour hopping at high temperatures and variable-range hopping (VRH) at low temperatures, consistent with Mott's formalism. The study reveals that short-range surface defects play a crucial role in tailoring the properties and device applications of MoS₂, highlighting the importance of improving sample quality through methods like chemical vapor deposition.This study investigates the charge transport in few-layer molybdenum disulfide (MoS₂) devices, focusing on the role of defect-induced localized states. Using transmission electron microscopy (TEM), density functional theory (DFT), and tight-binding calculations, the researchers provide evidence of sulfur vacancies (SVs) in MoS₂, which introduce localized donor states within the bandgap. At low carrier densities, transport is dominated by nearest-neighbour hopping at high temperatures and variable-range hopping (VRH) at low temperatures, consistent with Mott's formalism. The study reveals that short-range surface defects play a crucial role in tailoring the properties and device applications of MoS₂, highlighting the importance of improving sample quality through methods like chemical vapor deposition.
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