This study explores the creation of hyperreflective photonic crystals by optimizing the volume fraction of silica particles in photocurable dispersions and applying shear flow to align the colloidal crystals. The optimal volume fraction for high optical performance and uniformity is found to be around 50%, where shear flow facilitates the rearrangement of particles into larger, unidirectionally oriented crystalline domains. This results in absolute reflectivity of up to 90% at the stopband and high transparency of 90% at off-resonant wavelengths, with minimal diffusive scattering. The strong interparticle repulsion ensures uniform particle volume fraction, enhancing the reproducibility of the optical properties. The photonic films and patterns can be micropatterned using photolithography, creating intricate designs with mixed structural colors and multiple reflectance peaks without significant loss in reflectivity. These advanced photonic materials have potential applications in optical components, anticounterfeiting patches, and colorimetric sensors.This study explores the creation of hyperreflective photonic crystals by optimizing the volume fraction of silica particles in photocurable dispersions and applying shear flow to align the colloidal crystals. The optimal volume fraction for high optical performance and uniformity is found to be around 50%, where shear flow facilitates the rearrangement of particles into larger, unidirectionally oriented crystalline domains. This results in absolute reflectivity of up to 90% at the stopband and high transparency of 90% at off-resonant wavelengths, with minimal diffusive scattering. The strong interparticle repulsion ensures uniform particle volume fraction, enhancing the reproducibility of the optical properties. The photonic films and patterns can be micropatterned using photolithography, creating intricate designs with mixed structural colors and multiple reflectance peaks without significant loss in reflectivity. These advanced photonic materials have potential applications in optical components, anticounterfeiting patches, and colorimetric sensors.