This paper explores the fabrication of nanophotonic waveguides in silicon-on-insulator (SOI) using advanced CMOS technology, specifically deep ultraviolet (UV) lithography. The study aims to demonstrate the feasibility of commercially manufacturing nanophotonic integrated circuits. The authors compare photonic wires and photonic crystal waveguides, finding that photonic wires perform significantly better in terms of propagation losses, with measurements indicating losses as low as 0.24 dB/mm compared to 7.5 dB/mm for photonic crystal waveguides. The fabrication process involves deep UV lithography and dry etching, with a focus on minimizing sidewall roughness to reduce scattering. The paper also discusses the challenges and solutions for fabricating different types of structures in a single lithographic step, including the need for detailed process characterization and optical proximity correction (OPC) to account for the dense nature of photonic crystals. The results show that the proposed fabrication method can produce high-quality nanophotonic waveguides, making it a promising approach for the integration of photonic functions onto a single chip.This paper explores the fabrication of nanophotonic waveguides in silicon-on-insulator (SOI) using advanced CMOS technology, specifically deep ultraviolet (UV) lithography. The study aims to demonstrate the feasibility of commercially manufacturing nanophotonic integrated circuits. The authors compare photonic wires and photonic crystal waveguides, finding that photonic wires perform significantly better in terms of propagation losses, with measurements indicating losses as low as 0.24 dB/mm compared to 7.5 dB/mm for photonic crystal waveguides. The fabrication process involves deep UV lithography and dry etching, with a focus on minimizing sidewall roughness to reduce scattering. The paper also discusses the challenges and solutions for fabricating different types of structures in a single lithographic step, including the need for detailed process characterization and optical proximity correction (OPC) to account for the dense nature of photonic crystals. The results show that the proposed fabrication method can produce high-quality nanophotonic waveguides, making it a promising approach for the integration of photonic functions onto a single chip.