Steep-slope vertical-transport transistors built from sub-5 nm Thin van der Waals heterostructures

Steep-slope vertical-transport transistors built from sub-5 nm Thin van der Waals heterostructures

07 February 2024 | Qiyu Yang, Zheng-Dong Luo, Huali Duan, Xuetao Gan, Dawei Zhang, Yuewen Li, Dongxin Tan, Jan Seidel, Wenchao Chen, Yan Liu, Yue Hao, Genquan Han
This paper presents the development of steep-slope vertical-transport transistors (VTFETs) using sub-5 nm van der Waals (vdW) heterostructures. The researchers combined a gate-controllable van der Waals heterojunction with a metal-filamentary threshold switch (TS) to create VTFETs with a vertical transport channel thinner than 5 nm and sub-thermionic turn-on characteristics. The integrated TS-VTFETs exhibited efficient current switching behaviors, with a current modulation ratio exceeding 1 × 10^8 and an average sub-60 mV/dec subthreshold swing over 6 decades of drain current. The proposed TS-VTFETs offer excellent area- and energy-efficiency, addressing the performance degradation and downscaling challenges faced by conventional logic transistor technologies. The device's reliability was also systematically investigated, demonstrating strong voltage-cycling and DC-voltage stressing characteristics suitable for practical applications. The results provide a promising concept for future energy- and area-efficient vertical logic transistors.This paper presents the development of steep-slope vertical-transport transistors (VTFETs) using sub-5 nm van der Waals (vdW) heterostructures. The researchers combined a gate-controllable van der Waals heterojunction with a metal-filamentary threshold switch (TS) to create VTFETs with a vertical transport channel thinner than 5 nm and sub-thermionic turn-on characteristics. The integrated TS-VTFETs exhibited efficient current switching behaviors, with a current modulation ratio exceeding 1 × 10^8 and an average sub-60 mV/dec subthreshold swing over 6 decades of drain current. The proposed TS-VTFETs offer excellent area- and energy-efficiency, addressing the performance degradation and downscaling challenges faced by conventional logic transistor technologies. The device's reliability was also systematically investigated, demonstrating strong voltage-cycling and DC-voltage stressing characteristics suitable for practical applications. The results provide a promising concept for future energy- and area-efficient vertical logic transistors.
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[slides] Steep-slope vertical-transport transistors built from sub-5%E2%80%89nm Thin van der Waals heterostructures | StudySpace